Extreme ultraviolet lithography

Top Researchers

Paul W. M. Blom

Institution: —

J. Beckers

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Boy van Minderhout

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G. M. W. Kroesen

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Ton Peijnenburg

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Jon Underwood

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Long He

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Stefan Wurm

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Phil Seidel

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Kevin J. Orvek

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Particle contamination control by application of plasma

J. Beckers, Boy van Minderhout, Paul W. M. Blom, G. M. W. Kroesen, Ton Peijnenburg

Citations: 13 • 2020

Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography

Long He, Stefan Wurm, Phil Seidel, Kevin J. Orvek, Ernie Betancourt, Jon Underwood

Citations: 5 • 2008

Status and path to a final EUVL reticle-handling solution

Long He, Kevin J. Orvek, Phil Seidel, Stefan Wurm, Jon Underwood, Ernie Betancourt

Citations: 4 • 2007

Particle protection capability of SEMI-compliant EUV-pod carriers

George Huang, Long He, John Lystad, Tom Kielbaso, Cecilia Montgomery, Frank Goodwin

Citations: 2 • 2010