Extreme ultraviolet lithography

Particle contamination control by application of plasma

J. Beckers, Boy van Minderhout, Paul W. M. Blom, G. M. W. Kroesen, Ton Peijnenburg

引用数: 13 • 2020

Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography

Long He, Stefan Wurm, Phil Seidel, Kevin J. Orvek, Ernie Betancourt, Jon Underwood

引用数: 5 • 2008

Status and path to a final EUVL reticle-handling solution

Long He, Kevin J. Orvek, Phil Seidel, Stefan Wurm, Jon Underwood, Ernie Betancourt

引用数: 4 • 2007

Particle protection capability of SEMI-compliant EUV-pod carriers

George Huang, Long He, John Lystad, Tom Kielbaso, Cecilia Montgomery, Frank Goodwin

引用数: 2 • 2010