Ton Peijnenburg

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About

Ton Peijnenburg is a leading expert in contamination control for advanced semiconductor manufacturing, with a particular focus on the challenges posed by Extreme Ultraviolet (EUV) lithography. His research centers on understanding and mitigating particle contamination—a critical issue as semiconductor structures shrink to nanometer scales. Peijnenburg’s major contributions include pioneering the application of plasma-based techniques to control particle contamination in ultra-clean processing environments. His 2020 paper on particle contamination control via plasma, which has garnered 13 citations, established foundational methods for managing contaminants introduced from both internal and external sources in EUV scanners. Building on this, his 2023 work on the role of neutral drag force in pulsed plasma systems (7 citations) has advanced the mechanistic understanding of how plasma dynamics can be harnessed to remove nano- and micrometer-sized particles. These studies are vital for ensuring the reliability and yield of next-generation semiconductor fabrication. Peijnenburg’s work is highly influential in the field of ultraclean manufacturing, directly supporting the industry’s drive toward ever-smaller, more powerful electronic devices.