G. M. W. Kroesen

Papers

Total Citations

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About

G. M. W. Kroesen is a leading figure in plasma physics and its industrial applications, with a particular focus on contamination control in advanced lithography. His research addresses critical challenges in semiconductor manufacturing, especially for Extreme Ultraviolet (EUV) lithography, where particle contamination threatens yield and performance. Kroesen’s most cited work, "Particle contamination control by application of plasma" (2020, 13 citations), demonstrates how plasma-based methods can mitigate contamination from both internal and external sources in EUV scanners. This contribution is vital for the semiconductor industry as it scales down to smaller nodes. Beyond this, Kroesen has made notable contributions to plasma diagnostics, surface interactions, and the development of novel plasma sources. His work bridges fundamental plasma science with practical engineering, earning him recognition as a key innovator in the field. With a career spanning decades, Kroesen’s research has been instrumental in enabling next-generation lithography, and his insights continue to guide both academic researchers and industry professionals working on contamination control and plasma applications.