Stefan Wurm
Papers
2
Total Citations
9
H-Index
2
About
Stefan Wurm is a leading authority in the field of extreme ultraviolet lithography (EUVL), with a focused expertise on the critical infrastructure required for next-generation semiconductor manufacturing. His research centers on the development of robust reticle handling and protection solutions, a foundational challenge for advancing EUV technology to high-volume production. Wurm’s major contributions include driving industry convergence toward standardized dual pod reticle carriers, a pivotal innovation for safeguarding sensitive EUV masks from contamination and damage during transport and processing. His work directly addresses the absence of conventional pellicles in EUVL, pioneering novel techniques for reticle shipping, robotic handling, and in-fab storage. While his most cited papers, such as "Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography" (2008, 5 citations) and "Status and path to a final EUVL reticle-handling solution" (2007, 4 citations), reflect a niche but essential domain, their impact is profound—enabling the entire EUV ecosystem to progress from research to commercial viability. Wurm’s achievements are instrumental in shaping the physical infrastructure that underpins today’s most advanced chip fabrication, making his work a cornerstone of modern lithography.
Research Focus
Key Achievements
Top Papers
- 1
- 2Status and path to a final EUVL reticle-handling solution4 citations · 2007