Extreme ultraviolet
相关论文数: 3
顶级研究者
最高引用论文
Particle contamination control by application of plasma
J. Beckers, Boy van Minderhout, Paul W. M. Blom, G. M. W. Kroesen, Ton Peijnenburg
引用数: 13 • 2020
Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography
Long He, Stefan Wurm, Phil Seidel, Kevin J. Orvek, Ernie Betancourt, Jon Underwood
引用数: 5 • 2008
Particle protection capability of SEMI-compliant EUV-pod carriers
George Huang, Long He, John Lystad, Tom Kielbaso, Cecilia Montgomery, Frank Goodwin
引用数: 2 • 2010