Interference lithography

Related papers: 1

Top Researchers

Jon Underwood

Institution: —

Long He

Institution: —

Stefan Wurm

Institution: —

Phil Seidel

Institution: —

Kevin J. Orvek

Institution: —

Ernie Betancourt

Institution: —

Top Cited Papers

Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography

Long He, Stefan Wurm, Phil Seidel, Kevin J. Orvek, Ernie Betancourt, Jon Underwood

Citations: 5 • 2008

Related Technologies

Computer sciencePhysicsEngineeringOpticsNanotechnologyMaterials scienceMedicineSystems engineeringLithographyPhotolithography