Papers
2
Total Citations
10
H-Index
2
About
M. Farley is a key figure in the development of advanced ion implantation technology, with a career focused on high-current systems for semiconductor manufacturing. His most notable contributions center on the design and optimization of production-grade implanters, particularly for the creation of SIMOX (Separation by Implantation of Oxygen) wafers. Farley’s work on the Ibis 1000 SIMOX production implanter, documented in a 2002 paper (3 citations), represents a significant engineering achievement. This second-generation system, in use since 1995, enabled the reliable production of high-quality 150 mm and 200 mm SIMOX wafers, achieving exceptional implant uniformity and repeatability. His earlier foundational work, "A high-current ion implanter system" (1991, 7 citations), established the core design principles for these machines. While his citation counts are modest, Farley’s impact is measured in the practical, industrial-scale manufacturing of silicon-on-insulator substrates—a critical enabler for advanced microelectronics. His contributions helped bridge the gap between laboratory research and commercial viability, making him a respected figure in the field of ion implantation engineering.
Research Focus
Key Achievements
Top Papers
- 1A high-current ion implanter system7 citations · 1991
- 2The Ibis 1000 SIMOX production implanter3 citations · 2002