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About

Markus Thier is a precision engineering and control systems researcher whose work bridges the gap between robotics and nanoscale metrology. His primary research areas include high-precision positioning systems, disturbance rejection control, and integrated system design for inline metrology. Thier’s most impactful contribution is the development of a one degree-of-freedom nano-metrology platform, detailed in his 2017 paper (28 citations), which demonstrates an integrated system and control design approach for achieving nanometer-level accuracy. He further advanced this field with his 2021 work on supplemental peak filters for advanced disturbance rejection on a high-precision endeffector for robot-based inline metrology (19 citations). This study presents a metrology platform installed on a gantry robot, using an electromagnet to enable high-resolution measurements directly in a production line—a critical step toward real-time nanoscale quality control in manufacturing. Though earlier work on vibration compensation (5 citations) laid foundational concepts, Thier’s focus on practical, production-ready solutions marks him as a key figure in the evolution of precision robotics for industrial metrology.