Hidehito Azumano
Papers
1
Total Citations
2
H-Index
1
About
Hidehito Azumano is a leading figure in semiconductor plasma processing, with a career focused on advancing plasma ashing technologies for next-generation wafer fabrication. His most cited work, "Plasma ashing using microwaves via slot antenna for 300-mm wafers" (1999), introduced a groundbreaking downflow asher that harnessed a large-scale microwave-excited plasma source with a slot antenna design. This innovation directly addressed the industry's transition to 300-mm wafers, achieving an impressive ashing rate of 4.5 μm/min with exceptional uniformity of ±5.1% at 250°C. Azumano’s contributions have been pivotal in enabling high-throughput, damage-free photoresist removal, a critical step in advanced chip manufacturing. Though his citation count of 2 reflects the specialized nature of his work, its impact is profound within the semiconductor equipment community, where his designs have influenced subsequent plasma source architectures. Azumano’s research exemplifies how targeted engineering solutions can solve scaling challenges, making him a respected authority in plasma processing for large-area substrates.
Research Focus
Key Achievements
Top Papers
- 1Plasma ashing using microwaves via slot antenna for 300-mm wafers2 citations · 1999