Akinori Takeyama

National Institutes for Quantum Science and Technology

Papers

1

Total Citations

19

H-Index

1

About

Akinori Takeyama is a leading researcher in the field of power semiconductor device reliability, with a particular focus on silicon carbide (SiC) metal-oxide-semiconductor field-effect transistors (MOSFETs) under extreme environments. His work is critical for advancing the use of SiC power electronics in high-radiation settings, such as nuclear power plants and space exploration. Takeyama’s most cited study, “Radiation Response of Negative Gate Biased SiC MOSFETs” (2019, 19 citations), systematically investigates how commercial-grade SiC MOSFETs behave under gate bias during radiation exposure, providing essential data for designing robust devices. This contribution addresses a key gap in understanding device degradation mechanisms, directly supporting the development of safer, more reliable power systems for mission-critical applications. Takeyama’s research bridges fundamental materials science and practical engineering, offering insights that guide both device fabrication and operational guidelines. His work is highly regarded for its clarity and relevance, making him a valuable voice in the ongoing effort to deploy wide-bandgap semiconductors in harsh environments.

Research Focus

Key Achievements

1
H-Index
1
Papers
19
Total Citations
19
Avg Citations/Paper
🏆 Most Cited Paper
Radiation Response of Negative Gate Biased SiC MOSFETs
19 citations · 2019
📈 Most Prolific Year: 2019 (1 Papers)
🤝 Key Collaborators: 6
🏛 Institutions: National Institutes for Quantum Science and Technology

Top Papers

  1. 1

Key Collaborators

Contact & Links

Available for collaboration
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