W. Yoshikawa
Papers
1
Total Citations
17
H-Index
1
About
W. Yoshikawa is a materials scientist specializing in the development and fabrication of shape memory alloy thin films, with a particular focus on Ti–Ni systems. Their most-cited work, "Shape memory thin films formed with carrousel-type magnetron sputtering apparatus" (2005, 17 citations), introduces a novel deposition technique using a carrousel-type magnetron sputtering apparatus. This setup features a rotating substrate holder surrounded by independently controlled multiple targets, enabling simultaneous sputtering from a Ti–50 at.% Ni alloy target and a pure metal source. Yoshikawa’s major contribution lies in demonstrating how this apparatus allows precise control over film composition and uniformity, which is critical for achieving reliable shape memory effects in thin films. This innovation has practical implications for microelectromechanical systems (MEMS) and actuators, where miniaturized shape memory components are highly valued. With 17 citations, the work has influenced subsequent studies in thin-film fabrication and smart materials. Yoshikawa’s research bridges fundamental materials science and applied engineering, offering a scalable method for producing high-performance shape memory films. Their work is particularly notable for addressing the challenges of composition control in multi-target sputtering, a key hurdle in the field.
Research Focus
Key Achievements
Top Papers
- 1