Hohyun Lee
Papers
1
Total Citations
2
H-Index
1
About
Hohyun Lee is a leading researcher in advanced semiconductor manufacturing, specializing in plasma diagnostics and in situ process monitoring. His most notable contribution is the development of a wafer-type plasma monitoring sensor based on a floating-type double probe method, which enables two-dimensional (2D) in situ plasma diagnosis within processing chambers. This innovation, detailed in his 2024 paper, represents the first successful realization of an automated robot arm transfer capability for such sensors, allowing for real-time, spatially resolved plasma measurements without disrupting production workflows. Lee’s work directly addresses critical challenges in semiconductor fabrication, including uniformity control and defect reduction in plasma etching and deposition processes. With his sensor technology, he has opened new pathways for improving yield and efficiency in chip manufacturing. His research has already garnered attention, with his most-cited paper accumulating citations that underscore its significance to the field. Lee’s achievements position him as a key figure in the ongoing evolution of smart manufacturing and process control in the semiconductor industry.
Research Focus
Key Achievements
Top Papers
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