Reticle

The design, physical properties and clinical utility of an iris collimator for robotic radiosurgery

Gernot Echner, W Kilby, M. Lee, E. Earnst, S. Sayeh, Alexander Schlaefer, Bernhard Rhein, John Dooley, Christian Lång, Oliver Blanck, Étienne Lessard, Calvin R. Maurer, Wolfgang Schlegel

引用数: 127 • 2009

EL-4, a new generation electron-beam lithography system

H. C. Pfeiffer, Donald Edward Davis, W. A. Enichen, Michael S. Gordon, T. R. Groves, John G. Hartley, R. J. Quickle, James Donald Rockrohr, W. Stickel, Edward V. Weber

引用数: 22 • 1993

Real-time DIRCM system modeling

Mikael Petersson

引用数: 5 • 2004

Status of EUV reticle handling solution in meeting 32 nm HP EUV lithography

Long He, Stefan Wurm, Phil Seidel, Kevin J. Orvek, Ernie Betancourt, Jon Underwood

引用数: 5 • 2008

Status and path to a final EUVL reticle-handling solution

Long He, Kevin J. Orvek, Phil Seidel, Stefan Wurm, Jon Underwood, Ernie Betancourt

引用数: 4 • 2007