Secondary electrons

An electron-beam inspection system for x-ray mask production

Paul Sandland, W. D. Meisburger, D. J. Clark, R. R. Simmons, D. E. A. Smith, Lee H. Veneklasen, Bob Becker, Alan D. Brodie, C. H. Chadwick, Zhile Chen, L. S. Chuu, Darren Emge, Ami A. Desai, Hans Dohse, Achyut K. Dutta, J. D. Greene, L. A. Honfi, Jack Jau, S.G. Lele, M. Y. Ling, J. E. McMurtry, Richard Paul, C.-S. Pan, M. Robinson, J. K. H. Rough, Jim Taylor, P. Wieczorek, S. C. Wong

Citations: 14 • 1991