Xingcheng Zhang

Institute of Microelectronics

Papers

1

Total Citations

53

H-Index

1

About

Xingcheng Zhang is a leading researcher in the field of wide-bandgap semiconductor materials and optoelectronic devices, with a particular focus on β-Ga2O3 films. His most cited work, "Optoelectronic artificial synapses based on β-Ga2O3 films by RF magnetron sputtering" (2021, 53 citations), represents a significant breakthrough in neuromorphic computing hardware. Zhang pioneered the development of β-Ga2O3-based artificial synapses that mimic biological neural functions, demonstrating how this ultrawide-bandgap material can simultaneously detect and process optical signals—a critical step toward energy-efficient, brain-inspired computing systems. His research bridges materials science and device engineering, showing that RF magnetron sputtering, a scalable manufacturing technique, can produce high-quality β-Ga2O3 films with exceptional optoelectronic properties for synaptic applications. This work has garnered substantial attention for its potential to revolutionize artificial intelligence hardware by enabling all-optical neural networks. Zhang’s contributions are particularly notable for addressing key challenges in integrating photonic and electronic functionalities within a single material platform, positioning him as a rising authority in the development of next-generation intelligent sensors and neuromorphic devices.

Research Focus

Key Achievements

1
H-Index
1
Papers
53
Total Citations
53
Avg Citations/Paper
🏆 Most Cited Paper
Optoelectronic artificial synapses based on β-Ga2O3 films by RF magnetron sputtering
53 citations · 2021
📈 Most Prolific Year: 2021 (1 Papers)
🤝 Key Collaborators: 7
🏛 Institutions: Institute of Microelectronics

Top Papers

  1. 1

Key Collaborators

Contact & Links

Available for collaboration
Content generated · 11 days ago