Rik Peelen
Papers
1
Total Citations
1
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1
About
Rik Peelen is a researcher focused on plasma physics and contamination control, with particular expertise in particle behavior within low-pressure plasma environments. His work addresses critical challenges in semiconductor manufacturing, where even submicrometer particles can compromise device yields. Peelen’s major contribution lies in understanding how conducting and non-conducting particles behave during charging and de-charging processes in afterglow plasmas—a key mechanism for mitigating contamination introduced through robotic feedthroughs in cleanroom settings. His 2025 study on particle de-charging provides foundational insights for developing more effective contamination control strategies. While his citation count is currently modest, this reflects the emerging nature of his research area rather than its significance. Peelen’s work bridges fundamental plasma physics with practical industrial applications, offering solutions that could enhance the reliability of advanced semiconductor fabrication. His research is particularly valuable for engineers and scientists working on next-generation clean manufacturing processes, where understanding particle dynamics in low-pressure afterglow conditions is essential for maintaining ultralow contamination levels.
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