Jakub Grecner
Papers
1
Total Citations
1
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About
Jakub Grecner is a researcher focused on plasma physics and contamination control, with a particular emphasis on particle behavior in low-pressure plasma environments. His work addresses critical challenges in semiconductor manufacturing, where even submicrometer particles can compromise device performance. Grecner’s most cited paper, “Particle (de-)charging in low pressure afterglow plasma for contamination control: a comparative study between conducting and non-conducting particles” (2025, 1 citation), explores how particles introduced through robotic feedthroughs can be mitigated using plasma afterglow. By comparing conducting and non-conducting particles, he provides insights into charging and de-charging mechanisms that are essential for developing effective contamination control strategies. This research has direct implications for improving yield and reliability in advanced semiconductor fabrication. Grecner’s contributions are notable for bridging fundamental plasma science with practical industrial applications, offering a pathway to cleaner manufacturing processes. His work is particularly relevant for students and researchers interested in plasma-surface interactions, particle transport, and contamination engineering.
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