Pu‐Sheng Wang
Papers
1
Total Citations
4
H-Index
1
About
Pu-Sheng Wang is a researcher whose work centers on yield optimization and process control in advanced display manufacturing, with a particular focus on low-temperature polysilicon (LTPS) thin-film transistor (TFT) liquid crystal display (LCD) technology. His most cited paper, "Effective Approaches for Low Temperature Polysilicon TFT LCD Post-Mapping Yield Control Problem" (2005), addresses a critical challenge in the display industry: improving post-mapping yield when matching TFT and color-filter glass plates. This contribution is notable for providing systematic, practical solutions that help manufacturers reduce defects and enhance production efficiency—a key concern as LTPS technology gained traction for its superior performance over amorphous silicon displays. While his citation count is modest, Wang's work reflects deep engagement with the intersection of materials science, manufacturing engineering, and quality control. His research is particularly valuable for students and engineers seeking to understand real-world yield management in flat-panel display fabrication, offering a bridge between theoretical process models and industrial application.
Research Focus
Key Achievements
Top Papers
- 1