Computational Model for Substrate Motion in EB-PVD Process
Seungyup Baek, Vittaldas V. Prabhu
- Year
- 2009
- Citations
- 9
Abstract
This article presents a computational model for simulating the dynamic processes of EB-PVD where a complex substrate is coated inside a vapor plume evaporated from an ingot, while being manipulated on a holder. The motivation is to provide an efficient computation tool that combines the substrate manipulation with the evaporation and deposition process. This is important because the substrate motion significantly affects the microstructure and texture of the coating produced. Specifically, we mathematically formulate a substrate manipulation model using the coordinate transformation technique commonly used in robotics. The proposed model has been implemented in Matlab, and computational simulations are presented to illustrate the developments. The computational model is used for experiments to investigate manipulation parameters for a yttria-stabilized zirconia (YSZ) coating on a turbine blade.
Keywords
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