Plasma-enhanced chemical vapor deposition

顶级研究者

Jun Yang

研究机构: —

Dapeng Wei

研究机构: —

Kongyang Yi

研究机构: —

Donghua Liu

研究机构: —

Xiaosong Chen

研究机构: —

Yunqi Liu

研究机构: —

Dacheng Wei

研究机构: —

Nilton Itiro Morimoto

研究机构: —

Jacobus W. Swart

研究机构: —

Plasma-Enhanced Chemical Vapor Deposition of Two-Dimensional Materials for Applications

Kongyang Yi, Donghua Liu, Xiaosong Chen, Jun Yang, Dapeng Wei, Yunqi Liu, Dacheng Wei

引用数: 179 • 2021

Development of a Cluster Tool and Analysis of Deposition of Silicon Oxide by TEOSO<sub>2</sub> PECVD

Nilton Itiro Morimoto, Jacobus W. Swart

引用数: 8 • 1996